The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Jun. 04, 2007
Franz Eberhard, Regensburg, DE;
Uwe Strauss, Bad Abbach, DE;
Ulrich Zehnder, Regensburg, DE;
Andreas Weimar, Regensburg, DE;
Raimund Oberschmid, Sinzing, DE;
Franz Eberhard, Regensburg, DE;
Uwe Strauss, Bad Abbach, DE;
Ulrich Zehnder, Regensburg, DE;
Andreas Weimar, Regensburg, DE;
Raimund Oberschmid, Sinzing, DE;
Osram Opto Semiconductors GmbH, Regensburg, DE;
Abstract
A method for producing an optoelectronic component is disclosed. The method includes the steps of providing a substrate, applying a semiconductor layer sequence to the substrate, applying at least two current expansion layers to the semiconductor layer sequence, applying and patterning a mask layer, patterning the second current expansion layer by means of an etching process during which sidewalls of the mask layer are undercut, patterning the first current expansion layer by means of an etching process during which the sidewalls of the mask layer are undercut at least to a lesser extent than during the patterning of the second current expansion layer, and removing the mask layer.