The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Mar. 30, 2006
Takamitsu Okumura, Kanagawa, JP;
Takamitsu Okumura, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A diffusion material includes a prescribed scattering S(λ) of respective fine particles that are determined by Mie theory for all plural kinds of fine particles at a wavelength λ of an incident light. The diffusion material includes plural kinds of fine particles having different refractive indices, dispersed into a matrix. Each particle providing light intensity attenuating rate C(λ) in the diffusion material, and chromaticity variations Δx and Δy of the incident light. The diffusion power of the diffusion material by using determined chromaticity variations Δx and Δy; the diffusion material that is evaluated by this evaluation method and can emit illumination light free from wavelength unevenness. The diffusion material includes a blending the fine particles to provide the prescribed diffusion and uniform illumination.
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