The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Oct. 10, 2006
Takahito Chibana, Utsunomiya, JP;
Takahito Chibana, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for measuring a position of a stage, configured to hold a substrate, using a laser interferometer, and exposing the substrate through an original, and an optical element opposite to the substrate with a gap between the optical element and the substrate filled with liquid. A first supply nozzle is arranged around the optical element, which supplies the liquid to the gap, a first recovery nozzle arranged around the first supply nozzle recovers the liquid from the gap, a second supply nozzle supplies a gas outside the first recovery nozzle, a controller controls an amount of the liquid supplied from the first supply nozzle and an amount of the liquid and gas recovered from the first recovery nozzle, and a wall portion is arranged around the optical element and substantially parallel to a surface of the substrate. If Qis the amount of the liquid supplied from the first supply nozzle and Qis a sum of the amount of the liquid and gas recovered from the first recovery nozzle, a relationship Q<Qis satisfied.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile