The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2010

Filed:

Aug. 14, 2007
Applicants:

Robert D. Iverson, Racine, WI (US);

Francis J. Randall, Racine, WI (US);

Richard W. Avery, High Wycombe, GB;

John R. Wietfeldt, Franksville, WI (US);

Ashish Taneja, Racine, WI (US);

Tantiboro S. Ouattara, Racine, WI (US);

Inventors:

Robert D. Iverson, Racine, WI (US);

Francis J. Randall, Racine, WI (US);

Richard W. Avery, High Wycombe, GB;

John R. Wietfeldt, Franksville, WI (US);

Ashish Taneja, Racine, WI (US);

Tantiboro S. Ouattara, Racine, WI (US);

Assignee:

S.C. Johnson & Son, Inc., Racine, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/37 (2006.01); C11D 1/68 (2006.01); C11D 3/43 (2006.01); C11D 7/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hydrophilic polymer, at least one nonionic surfactant, at least one solvent, an acid and water, wherein the acid provides the composition with a pH of about 2 to 3.5 and the composition is provided in the absence of any anionic, cationic or amphoteric surfactant.


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