The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Apr. 21, 2005
Maja Hackenberger, Nittendorf, DE;
Johannes Voelkl, Erlangen, DE;
Roland Zeisel, Tegernheim, DE;
Osram Opto Semiconductors GmbH, Regensburg, DE;
Abstract
A process for structuring at least one layer as well as an electrical component with structures from the layer are described. The invention states a process to generate at least one structured layer (A), wherein a mask structure () with a first (A) and second structure (B) is generated on a layer () which is present on a substrate (). Through this mask structure (), the first layer (A) is transferred onto the layer () using isotropic structuring processes, and the second structure (B) is transferred onto the layer () using anisotropic structuring processes. The process as per the invention permits the generation of two structures (A,B) in at least a single layer while using a single mask structure.