The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7741144 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 22, 2010

Filed:

Oct. 31, 2008
Applicants:

Soo Young Choi, Fremont, CA (US);

Yong-kee Chae, Pleasanton, CA (US);

Shuran Sheng, Santa Clara, CA (US);

Liwei LI, Sunnyvale, CA (US);

Inventors:

Soo Young Choi, Fremont, CA (US);

Yong-Kee Chae, Pleasanton, CA (US);

Shuran Sheng, Santa Clara, CA (US);

Liwei Li, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/142 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments of the present invention include an improved method of forming a thin film solar cell device using a plasma processing treatment between two or more deposition steps. Embodiments of the invention also generally provide a method and apparatus for forming the same. The present invention may be used to advantage to form other single junction, tandem junction, or multi-junction solar cell devices.


Find Patent Forward Citations

Choi, Soo. (2010). Plasma treatment between deposition processes (U.S. Patent No. 7741144). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7741144

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…