The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2010
Filed:
Apr. 10, 2006
Declan Ryan, Cahirdown, IE;
Babak Amir-parviz, Seattle, WA (US);
Vincent Linder, Renens, CH;
Vincent Semetey, Le Mans, FR;
Samuel K. Sia, New York, NY (US);
George M. Whitesides, Newton, MA (US);
Declan Ryan, Cahirdown, IE;
Babak Amir-Parviz, Seattle, WA (US);
Vincent Linder, Renens, CH;
Vincent Semetey, Le Mans, FR;
Samuel K. Sia, New York, NY (US);
George M. Whitesides, Newton, MA (US);
President and Fellows of Harvard College, Cambridge, MA (US);
Abstract
A series of methods, compositions, and articles for patterning a surface with multiple, aligned layers of molecules, by exposing the molecules to electromagnetic radiation is provided. In certain embodiments, a single photomask acts as an area-selective filter for light at multiple wavelengths. A single set of exposures of multiple wavelengths through this photomask may make it possible to fabricate a pattern comprising discontinuous multiple regions, where the regions differ from each other in at least one chemical and/or physical property, without acts of alignment between the exposures. In certain embodiments, the surface includes molecules attached thereto that can be photocleaved upon exposure to a certain wavelength of radiation, thereby altering the chemical composition on at least a portion of the surface.