The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Jul. 21, 2005
Applicants:
Sébastien Weitbruch, Niedereschach, DE;
Cédric Thebault, Villingen-Schwenningen, DE;
Carlos Correa, Villingen-Schwenningen, DE;
Inventors:
Sébastien Weitbruch, Niedereschach, DE;
Cédric Thebault, Villingen-Schwenningen, DE;
Carlos Correa, Villingen-Schwenningen, DE;
Assignee:
Thomson Licensing, Boulogne-Billancourt, FR;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
For improving the grey scale portrayal, several dithering methods are used: Cell-based dithering, multi-mask dithering or error diffusion. Each of them has specific disadvantages. A simple combination of them does not bring expected advantages. However, an improvement is obtained if the result of the multi-mask dithering is used for controlling the error diffusion by a switch, for example.