The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2010

Filed:

Jun. 27, 2008
Applicants:

Bangalore R. Natarajan, Cupertino, CA (US);

Kasra Khazeni, San Jose, CA (US);

David Heald, Solvang, CA (US);

Rihui He, San Jose, CA (US);

Sriram Akella, San Jose, CA (US);

Evgeni Gousev, Saratoga, CA (US);

Inventors:

Bangalore R. Natarajan, Cupertino, CA (US);

Kasra Khazeni, San Jose, CA (US);

David Heald, Solvang, CA (US);

Rihui He, San Jose, CA (US);

Sriram Akella, San Jose, CA (US);

Evgeni Gousev, Saratoga, CA (US);

Assignee:

QUALCOMM MEMS Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02F 1/03 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods, devices, and systems provide MEMS devices exhibiting at least one of reduced stiction, reduced hydrophilicity, or reduced variability of certain electrical characteristics using MEMS devices treated with water vapor. The treatment is believed to form one or more passivated surfaces on the interior and/or exterior of the MEMS devices. Relatively gentle temperature and pressure conditions ensure modification of surface chemistry without excessive water absorption after removal of sacrificial material to release the MEMS devices.


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