The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Jan. 26, 2007
Masaaki Otoshi, Shizuoka, JP;
Takanori Sato, Shizuoka, JP;
Tadashi Ueda, Shizuoka, JP;
Fumitaka Terai, Shizuoka, JP;
Masaaki Otoshi, Shizuoka, JP;
Takanori Sato, Shizuoka, JP;
Tadashi Ueda, Shizuoka, JP;
Fumitaka Terai, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A method is provided for manufacturing a wide band retardation plate which gives uniform phase difference characteristics to incident light over the whole visible wavelength region, and which, as it permits selection of raw materials regardless of whether they have a positive or negative intrinsic double refraction value, allows a wide selection of raw materials. For this purpose, the method comprises a machine direction-stretched film-forming step for transporting and stretching in an identical direction to the transport direction, a Material A of two or more materials having different positive intrinsic double refraction values to form a machine direction-stretched film, a transverse direction-stretched film-forming step for transporting and stretching in a perpendicular direction to the transport direction, a Material B of the aforesaid two or more materials to form a transverse direction-stretched film, and a lamination step for laminating the machine direction-stretched film and the transverse direction-stretched film.