The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2010

Filed:

Oct. 11, 2006
Applicant:

Susumu Akamatsu, Osaka, JP;

Inventor:

Susumu Akamatsu, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

A gate insulating film and a gate electrode are formed on an active region of a semiconductor substrate. A sidewall forming an L shape in cross section is formed on the sides of the gate electrode. Source/drain regions are formed in regions of the semiconductor substrate located outside an area covering the gate electrode and the sidewall. A stress-applying stress liner film is formed to cover the gate electrode and the sidewall.


Find Patent Forward Citations

Loading…