The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Feb. 14, 2008
BO Sung Kim, Seoul, KR;
Kwan-wook Jung, Suwon, KR;
Wan-shick Hong, Seoul, KR;
Sang-gab Kim, Seoul, KR;
Mun-pyo Hong, Seongnam, KR;
Bo Sung Kim, Seoul, KR;
Kwan-Wook Jung, Suwon, KR;
Wan-Shick Hong, Seoul, KR;
Sang-Gab Kim, Seoul, KR;
Mun-Pyo Hong, Seongnam, KR;
Abstract
A method for manufacturing a semiconductor device including forming a first wire on a substrate, forming a lower film on the first wire, forming a photosensitive pattern on the lower film using a photosensitive material, forming contact holes for exposing the first wire by etching the lower film using the photosensitive film as an etching mask, removing part of the photosensitive film pattern by an ashing process to expose a borderline of the lower film defining the contact holes and forming second wire connected to the first wire via the contact holes.