The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Nov. 15, 2006
Kenzo Fukuyoshi, Tokyo, JP;
Tadashi Ishimatsu, Tokyo, JP;
Keisuke Ogata, Tokyo, JP;
Mitsuhiro Nakao, Tokyo, JP;
Akiko Uchibori, Tokyo, JP;
Kenzo Fukuyoshi, Tokyo, JP;
Tadashi Ishimatsu, Tokyo, JP;
Keisuke Ogata, Tokyo, JP;
Mitsuhiro Nakao, Tokyo, JP;
Akiko Uchibori, Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heat-flowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.