The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Mar. 29, 2005
Daisaku Matsunaga, Minato-ku, JP;
Masanori Hashimoto, Koshigaya, JP;
Christian Ruslim, Tsukuba, JP;
Takashi Tamaki, Tsukuba, JP;
Kunihiro Ichimura, Yokohama, JP;
Daisaku Matsunaga, Minato-ku, JP;
Masanori Hashimoto, Koshigaya, JP;
Christian Ruslim, Tsukuba, JP;
Takashi Tamaki, Tsukuba, JP;
Kunihiro Ichimura, Yokohama, JP;
National Institute Of Advanced Industrial Science and Technology, Tokyo, JP;
Nippon Kayaku Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention relates to a micropattern retardation element requiring no stretch processing and no extremely high positioning accuracy in cutting films, and the like, and having the retardation region controlled in width of a micron unit, and a producing method therefore. Said micropattern retardation element can be obtained by forming a liquid crystalline or non liquid crystalline polymer thin film layer having photoactive groups, on a substrate, and then, after orientation treatment in a micropattern form, forming a birefringence layer so as to contact with said polymer thin film layer, so that birefringence molecules of said birefringence layer are oriented according to orientation of photoactive groups in said thin film. Said retardation element is used in a three-dimensional display, and the like.