The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2010

Filed:

Mar. 26, 2007
Applicants:

Ho-chieh Yu, Taoyuan, TW;

Jiun-you Lin, Sinjhuang, TW;

Hung-yi Chuang, Hsinchu, TW;

Tsai-pao Chiang, Luchu Hsiang, TW;

Inventors:

Ho-Chieh Yu, Taoyuan, TW;

Jiun-You Lin, Sinjhuang, TW;

Hung-Yi Chuang, Hsinchu, TW;

Tsai-Pao Chiang, Luchu Hsiang, TW;

Assignee:

TA-I Technology Co., Ltd, Luchu Hsiang, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02H 7/20 (2006.01); H02H 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a chip scale gas discharge protective device whose metal coupled electrodes are fabricated through processes of yellow light, image formation, and electro casting of metal electrode, and the two electrodes are facing each other in arch lines with the distance of a gap controlled within the range of 0.5˜10 μm, wherein the entire structure is performed by a bridge process without an extra gas filling procedure in the gap. Due to the fact that the gap is as small as only several μm, a relevant potential difference existing across there is sufficient to ionize the air thereby suppressing the electro-static discharge (ESD) through the protected electronic device, whereas the fabrication method is disclosed.


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