The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2010

Filed:

Apr. 06, 2006
Applicants:

Mikel John Stanich, Longmont, CO (US);

Chai Wah Wu, Poughquag, NY (US);

Gerhard Robert Thompson, Wappingers Falls, NY (US);

Inventors:

Mikel John Stanich, Longmont, CO (US);

Chai Wah Wu, Poughquag, NY (US);

Gerhard Robert Thompson, Wappingers Falls, NY (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 15/00 (2006.01); H04N 1/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are a method, system, and program for generating threshold values in a dither matrix. A dither matrix of threshold values is generated. The threshold values in the dither matrix are filtered to generate a filtered dither matrix of filtered dither values by performing for dither values in the dither matrix: determining a region of dither values in the dither matrix that surrounds the value being considered, wherein the dither values in the determined region comprise one of dither values in a first portion of the region within the dither matrix or a wrap around dither value in a second portion of the region that extends beyond the dither matrix; and using an offset value to determine one wrap around dither value, wherein repeated instances of the dither matrix are designed to be applied to an image by forming a tile pattern of the repeated instances of the matrix over the image pattern, and wherein the repeated instances of the matrix in the tile pattern are offset in one direction by the offset value; and performing an operation on the determined dither values in the region to determine a filtered value for the dither value being considered.


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