The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Dec. 27, 2007
Applicants:
Toyoki Kanzaki, Kyoto, JP;
Tatsuo Ohka, Kyoto, JP;
Teruhiko Ikeda, Kyoto, JP;
Inventors:
Assignee:
Horiba, Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The defect inspection apparatus and method for determining an acceptable condition of a reticle/mask member with a pattern area to be developed on a semiconductor device includes determining a non-pattern area and designating an inspection target area within a non-pattern area. Light is scanned across the inspection target area and detected to provide representative signals. The representative signals are processed to define the status of foreign matter including size and location and further compared with predetermined values to determine the acceptability of the mask for continued production purposes.