The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Mar. 17, 2006
Ryo Nawata, Utsunomiya, JP;
Ryo Nawata, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a beam providing unit having a first component and second component to provide an exposure beam having pattern information to a substrate W, a measurement unit which measures a relative variation between the first component and the second component, a driving mechanism which drives at least one of the first component and second component, and a compensator which controls the driving mechanism on the basis of the measurement result obtained by the measurement unit so as to reduce the relative variation between the first component and the second component in at least the period during which the pattern is transferred onto the substrate.