The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2010

Filed:

Jun. 30, 2006
Applicants:

Sylvain Lefebvre, La Fouillouse, FR;

Hugues H. Hoppe, Redmond, WA (US);

Inventors:

Sylvain Lefebvre, La Fouillouse, FR;

Hugues H. Hoppe, Redmond, WA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G09G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An anisometric texture synthesis system and method for generating anisometric textures having a similar visual appearance as a given exemplar, but with varying orientation and scale. This variation is achieved by modifying the upsampling and correaction processes of the texture synthesis technique using a Jacobian field. The modified correaction process includes accessing only immediate neighbors of a pixel instead of non-local pixels. This constraint that only immediate neighbors be used also allows the generation of seamless anisometric surface textures. This is achieved by using indireaction maps containing indirection pointers that are used to jump from a set of pixels outside the boundary of a texture atlas chart to another chart. The system and method also includes an anisometric synthesis magnification technique that uses a Jacobian field to modify the magnification step of a synthesis magnification scheme and account for anisometry.


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