The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Feb. 08, 2007
Hiroshi Motoki, Yokohama, JP;
Hiroshi Motoki, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern inspection method includes: irradiating a first region of a surface of a sample having a pattern to be inspected with a charged particle beam; acquiring a first two-dimensional image showing a state of the surface of the sample; searching for a pattern similar to a previously prepared reference image within the first two-dimensional image; when the pattern similar to the reference image is not detected in the first two-dimensional image, irradiating a second region of the surface of the sample that has not been irradiated with a charged particle beam; acquiring a second two-dimensional image showing a state of the surface of the sample; and searching a pattern similar to the reference image within the second two-dimensional image.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile