The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
May. 23, 2005
Applicants:
Yuko Tsuchiya, Tokorozawa, JP;
Susumu Soeya, Tokyo, JP;
Hiromasa Takahashi, Hachioji, JP;
Inventors:
Assignee:
Hitachi, Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B28B 3/00 (2006.01); B05D 5/10 (2006.01); G11B 5/71 (2006.01); C03C 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for producing a recording medium provides good throughput for mass production and reduces cost. The method facilitates the control of the shape or dimensions of a pattern obtained by microfabrication, allows an accurate pattern transfer, and provides superior uniformity. A magnetic layer is formed on a substrate. A nano-particle filmis formed on a desired portion on the magnetic layer. Using the nano-particle film as a mask, the magnetic layer is cut. A micropattern with concavities and convexities is formed on the magnetic layer by removing the nano-particle film.