The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2010

Filed:

Dec. 12, 2006
Applicants:

Alberto Argoitia, Santa Rosa, CA (US);

Dishuan Chu, Rohnert Park, CA (US);

Neil Teitelbaum, Ottawa, CA;

Inventors:

Alberto Argoitia, Santa Rosa, CA (US);

Dishuan Chu, Rohnert Park, CA (US);

Neil Teitelbaum, Ottawa, CA;

Assignee:

JDS Uniphase Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/00 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

A metameric optical structure is disclosed having first optical structures comprising diffractive flakes having diffractive structures thereon, and a second optical structures having non-diffractive flakes which may have other special effect properties, such as color shifting. At one angle of incidence or one viewing angle, near normal. The hues match and at other angles they do not match. The diffractive flakes are preferably magnetically aligned so that the grating structures are parallel. Disclosed is also an image formed of at least a first region of diffractive flakes and a second region of non-diffractive flakes wherein the regions are adjacent one another and wherein one of the regions forms a logo, symbol or indicia that appears or disappears in dependence upon the angle of viewing.


Find Patent Forward Citations

Loading…