The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Mar. 12, 2008
Kaichiang Chang, Northborough, MA (US);
William Kennedy, Boston, MA (US);
Kaichiang Chang, Northborough, MA (US);
William Kennedy, Boston, MA (US);
Raytheon Company, Waltham, MA (US);
Abstract
An adaptive processing method of and system for clutter rejection in a phased array beam pattern. The amplitude distribution of the transmit elements of a two-dimensional phased array is determined. A desired pattern with low side lobes for a linear array is synthesized. The amplitude distribution of the transmit elements of the two-dimensional phased array is compared with the synthesized pattern. Select elements of the two-dimensional array are disabled to best fit the determined amplitude distribution of the transmit elements of the two-dimensional phased array to the synthesized beam pattern. Phase only pattern synthesis is performed to produce a desired two-dimensional beam pattern with low side lobes to minimize any best fit errors.