The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2010

Filed:

Oct. 28, 2005
Applicants:

Godhard Walf, Berlin, DE;

Berndt Kuhlow, Berlin, DE;

Inventors:

Godhard Walf, Berlin, DE;

Berndt Kuhlow, Berlin, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a lithographic system, data transmission is carried out by a powerful electro-optical free-beam connection system enabling optical pattern data to be guided from light exit places to light entrance places inside the vacuum chamber by free-space optical beams in order to produce control signals. The burden on the pattern production system is significantly reduced by the disappearance of mechanical and electrical contacts. The paths of the free-space optical beams and the particle beams can intersect each other in a non-influential manner. Active photodiodes acting as light exit places can be spatially disposed directly in the pattern production system. Passive light waveguides which can be bundled together to form multipolar fibre array plugs, or active transmission lasers, either of which can also act as light exit places, can be arranged outside the vacuum chamber.


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