The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Jan. 25, 2008
Richard B. Miles, Princeton, NJ (US);
Arthur Dogariu, Hamilton, NJ (US);
Alexander Goltsov, Troitsk, RU;
Mikhail N. Shneider, Princeton, NJ (US);
Zhili Zhang, Princeton, NJ (US);
Richard B. Miles, Princeton, NJ (US);
Arthur Dogariu, Hamilton, NJ (US);
Alexander Goltsov, Troitsk, RU;
Mikhail N. Shneider, Princeton, NJ (US);
Zhili Zhang, Princeton, NJ (US);
The Trustees of Princeton University, Princeton, NJ (US);
Abstract
A method and apparatus for remotely monitoring properties of gases and plasmas, and surface and sub-surface properties of materials, is disclosed. A laser beam is focused at a desired region within a gas, plasma, or material (e.g., solid or liquid) to be analyzed, generating an ionized sample region or a localized, enhanced free carrier region. A beam of microwave radiation is directed toward the ionized sample region or the free carrier region, and the microwave radiation is scattered. The scattered microwave radiation is received by a microwave receiver, and is processed by a microwave detection system to determine properties of the gas, plasma, or material, including surface and sub-surface properties.