The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7727703 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 01, 2010

Filed:

Nov. 08, 2006
Applicants:

Po-yuan Lo, Taipei, TW;

Feng-yu Yang, Taichung County, TW;

Zing-way Pei, Taichung, TW;

Inventors:

Po-Yuan Lo, Taipei, TW;

Feng-Yu Yang, Taichung County, TW;

Zing-Way Pei, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of fabricating an electronic device is disclosed. The method of fabricating an electronic device comprises providing a substrate. A first conductive layer is formed on the substrate. A silylation polyphenol (PVP) dielectric layer is formed on the first conductive layer. A patterned second conductive layer is formed on the silylation PVP dielectric layer.


Find Patent Forward Citations

Lo, Po-Yuan. (2010). Methods of fabricating an electronic device and an sililation polyvinyl phenol for a dielectric layer of an electronic device (U.S. Patent No. 7727703). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7727703

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