The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Sep. 30, 2005
Eizo Watanabe, Inzai-shi, Chiba, JP;
Toshiyuki Watanabe, Fuchu, JP;
Masato Sone, Fuchu, JP;
Yoshinori Matsuoka, Nishinomiya, JP;
Hideo Miyake, Sakai, JP;
Masayasu Iida, Sakai, JP;
Eizo Watanabe, Inzai-shi, Chiba, JP;
Toshiyuki Watanabe, Fuchu, JP;
Masato Sone, Fuchu, JP;
Yoshinori Matsuoka, Nishinomiya, JP;
Hideo Miyake, Sakai, JP;
Masayasu Iida, Sakai, JP;
Abstract
The present invention provides a method and an apparatus for preparing a silicon-containing solid film, which can form a thin film uniformly over a wide area. Raw-material fluid comprising a silane derivative and a hydrocarbon derivative is mixed with carrier fluid comprising carbon dioxide to form a supercritical condition. Further, an active-state is produced in the raw-material fluid of the supercritical fluid by a catalytic reaction with at least one metal catalyst selected from a group consisting of platinum, tungsten, cobalt, nickel, iron or an alloy of each of them. The fluid is blown to the substrate, thereby forming a silicon-containing solid film or a hydrocarbon-containing solid film on the substrate.