The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2010

Filed:

Feb. 05, 2007
Applicants:

Michael Backer, Cologne, DE;

Brigitte Schlobach, Bannewitz, DE;

Kerstin Knoth, Dresden, DE;

Barbara Schupp-niewa, Hallbergmoos, DE;

Ruben Huhne, Dresden, DE;

Martina Falter, Swisttal-Buschhoven, DE;

Inventors:

Michael Backer, Cologne, DE;

Brigitte Schlobach, Bannewitz, DE;

Kerstin Knoth, Dresden, DE;

Barbara Schupp-Niewa, Hallbergmoos, DE;

Ruben Huhne, Dresden, DE;

Martina Falter, Swisttal-Buschhoven, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01); H01L 39/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

The formation of band-shaped HTSL on a metal substrate is disclosed. The HTSL includes at least one buffer layer comprising zirconates and/or rare-earth oxides. The HTSL layer is formed on the buffer layer. The buffer layer has a texturing that in the case of a RHEED measurement results in discrete reflexes and not only in diffraction rings. In particular, the buffer layer may be textured along its interface with the HTSL layer.


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