The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2010

Filed:

Mar. 14, 2006
Applicants:

Atsuo Kondou, Okazaki, JP;

Yasumasa Fujioka, Nagoya, JP;

Takeshi Sakuma, Nagoya, JP;

Masaaki Masuda, Nagoya, JP;

Kenji Dosaka, Shioya-gun, JP;

Keizo Iwama, Shioya-gun, JP;

Inventors:

Atsuo Kondou, Okazaki, JP;

Yasumasa Fujioka, Nagoya, JP;

Takeshi Sakuma, Nagoya, JP;

Masaaki Masuda, Nagoya, JP;

Kenji Dosaka, Shioya-gun, JP;

Keizo Iwama, Shioya-gun, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma reactor is provided with two or more plasma generating electrodes which are installed in series inside a gas passage in a casing, with each plasma generating electrode being electrically controlled independently. The surface area of the conductor on each unit electrode forming the plasma generating electrode installed on the upstream side of the gas passage is smaller than the surface area of the conductor on the unit electrode forming the plasma generating electrode installed on the downstream side of the gas passage. Plasma can be generated between each of the unit electrodes by supplying each of the plasma generating electrodes with independently controlled electric power. The plasma reactor can efficiently react specific components contained in the gas passing through the gas passage.


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