The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Dec. 19, 2005
Hirohisa Kikuyama, Osaka, JP;
Masahide Waki, Osaka, JP;
Kanenori Ito, Sakai, JP;
Takanobu Kujime, Sakai, JP;
Keiichi Nii, Sakai, JP;
Rui Hasebe, Sakai, JP;
Hitoshi Tsurumaru, Sakai, JP;
Hideki Nakashima, Sakai, JP;
Hirohisa Kikuyama, Osaka, JP;
Masahide Waki, Osaka, JP;
Kanenori Ito, Sakai, JP;
Takanobu Kujime, Sakai, JP;
Keiichi Nii, Sakai, JP;
Rui Hasebe, Sakai, JP;
Hitoshi Tsurumaru, Sakai, JP;
Hideki Nakashima, Sakai, JP;
Stella Chemifa Corporation, Osaka, JP;
Abstract
A fine treatment agent according to the present invention is a fine treatment agent for the fine treatment of a multilayer film, including a tungsten film and a silicon oxide film comprising at least one from among hydrogen fluoride, nitric acid, ammonium fluoride and ammonium chloride. Thus, a fine treatment agent which makes fine treatment on a multilayer film, including a tungsten film and a silicon oxide film, possible by controlling the etching rate and a fine treatment method using the same can be provided.