The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Mar. 11, 2008
Kenichi Murakami, Kuwana, JP;
Kenichi Murakami, Kuwana, JP;
Brother Kogyo Kabushiki Kaisha, Nagoya-shi, Aichi-ken, JP;
Abstract
A method of accurately forming lower partitions than spacers on a substrate in an electrophoretic medium includes a first resist application step where a first negative resist is applied on the first substrate, a first exposure step where the first negative resist is exposed to light through a first mask having an aperture pattern for exposing a pattern of the partition to light, a second resist application step where a second negative resist is applied on the first negative resist, a second exposure step where the second negative resist and the first negative resist are exposed to light through a second mask having an aperture pattern for exposing a pattern of the spacer to light, and a development step where the first negative resist and the second negative resist are developed.