The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Dec. 21, 2006
Yoshio Gomei, Utsunomiya, JP;
Hiromitsu Takase, Utsunomiya, JP;
Shigeru Terashima, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for exposing a substrate to exposure light via an original. The apparatus includes a reflector, which includes a multilayer film and a ruthenium film, and reflects the exposure light. The multilayer film reflects the exposure light, and the ruthenium film is arranged on the multilayer film. A vacuum container contains the reflector, an exhauster exhausts exhaust gas in the vacuum container, and a regulator supplies water vapor into the vacuum container and regulates an amount of the water vapor in the vacuum container, based on an amount of carbonaceous gas in the vacuum chamber, so as to retard oxidation of the ruthenium film.