The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Apr. 07, 2005
Applicants:
Chad A. Mirkin, Wilmette, IL (US);
Seunghun Hong, Chicago, IL (US);
Vinayak P. Dravid, Glenview, IL (US);
Inventors:
Chad A. Mirkin, Wilmette, IL (US);
Seunghun Hong, Chicago, IL (US);
Vinayak P. Dravid, Glenview, IL (US);
Assignee:
Northwestern University, Evanston, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); B05D 1/36 (2006.01); B05D 7/24 (2006.01); B01J 19/08 (2006.01); C12Q 1/68 (2006.01); C12P 19/34 (2006.01);
U.S. Cl.
CPC ...
Abstract
In one aspect, a method of nanolithography is provided using a driving force to control the movement of a deposition compound from a scanning probe microscope tip to a substrate. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.