The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Sep. 20, 2005
Sharad Kapur, Hoboken, NJ (US);
David E. Long, New Providence, NJ (US);
Sharad Kapur, Hoboken, NJ (US);
David E. Long, New Providence, NJ (US);
Other;
Abstract
Significant improvement is achieved in the analysis of IC layout by utilizing the fact that IC designs exhibit a large amount of regularity. By employing a unique mesh generation approach that takes advantage of the regularity, combined with the use of a limited number of different shapes for the majority of the IC geometry greatly increases the speed of processing. Additionally, by employing a unique approach for specifying the different mesh elements—based on the parameters that define the relative difference between one shape and another—provides significant additional reductions in the necessary calculations, and a corresponding increase in speed of IC simulations. Yet another improvement is realized by simplifying the inductive influence calculations by employing averages that permit using dot products of vectors rather than integrations of non-constant vectors.