The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7719754 B1

PDF
Full Text
Expired
Date of Patent:
May. 18, 2010

Filed:

Sep. 30, 2008
Applicants:

Sapna Patel, Fremont, CA (US);

Fan Zhong, Fremont, CA (US);

Inventors:

Sapna Patel, Fremont, CA (US);

Fan Zhong, Fremont, CA (US);

Assignee:

Qualcomm Mems Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

In various embodiments described herein, methods for forming a plurality of microelectromechanical systems (MEMS) devices on a substrate are described. The MEMS devices comprise x number of different sacrificial or mechanical structures with x number of different sacrificial structure thicknesses or mechanical structure stiffnesses and wherein the x number of sacrificial or mechanical structures are formed by x-1 depositions and x-1 masks.


Find Patent Forward Citations

Patel, Sapna. (2010). Multi-thickness layers for mems and mask-saving sequence for same (U.S. Patent No. 7719754). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7719754

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