The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Jul. 12, 2006
Hideo Nakata, Suwa, JP;
Takeshi Miyashita, Suwa, JP;
Hideo Nakata, Suwa, JP;
Takeshi Miyashita, Suwa, JP;
Seiko Epson Corporation, , JP;
Abstract
A manufacturing apparatus for a liquid crystal device having a pair of substrates facing each other, an oriented film formed on an facing surface of at least one substrate in the pair of the substrates, and a liquid crystal held between the pair of substrates, includes: a film formation chamber; an evaporating section having an evaporation source, evaporating an inorganic material on the substrate in the film formation chamber by a physical vapor deposition, and forming an oriented film and a base film arranged under the oriented film; a base film formation area forming the base film and located substantially above the evaporation source in the film formation chamber; and an oriented film formation area located obliquely above the evaporation source in the film formation chamber, forming the oriented film and having a shielding plate having an elongated opening for selectively evaporating an inorganic material.