The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2010

Filed:

Jul. 14, 2005
Applicants:

Ricardo Machado, Caxias do Sul/RS, BR;

Waldyr Ristow, Jr., Caxias do Sul/RS, BR;

Aloisio Nelmo Klein, Florianópolis/SC, BR;

Joel Louis Rene Muzart, Florianópolis/SC, BR;

Marcio Celso Fredel, Florianópolis/SC, BR;

Paulo Antonio Pereira Wendhausen, Florianópolis/SC, BR;

Davi Fusão, Florianópolis/SC, BR;

Paulo Roberto Alba, Caxias do Sul/RS, BR;

Nilton Francisco Oliveira Da Silva, São José/SC, BR;

Luciano Antonio Mendes, Caxias do Sul/RS, BR;

Inventors:

Ricardo Machado, Caxias do Sul/RS, BR;

Waldyr Ristow, Jr., Caxias do Sul/RS, BR;

Aloisio Nelmo Klein, Florianópolis/SC, BR;

Joel Louis Rene Muzart, Florianópolis/SC, BR;

Marcio Celso Fredel, Florianópolis/SC, BR;

Paulo Antonio Pereira Wendhausen, Florianópolis/SC, BR;

Davi Fusão, Florianópolis/SC, BR;

Paulo Roberto Alba, Caxias do Sul/RS, BR;

Nilton Francisco Oliveira da Silva, São José/SC, BR;

Luciano Antonio Mendes, Caxias do Sul/RS, BR;

Assignee:

Lupatech S.A., Caxias do Sul/RS, CEP, BR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 9/00 (2006.01); B23K 9/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Industrial plasma reactor for plasma assisted thermal debinding of power injection-molded parts is a reactor used for the plasma assisted debinding and sintering of metallic or ceramic parts produced by the powder injection molding process, comprising a vacuum chamber () containing a cathode-anode () system for plasma generation and a resistive heating system () in the same vacuum chamber () ambient.


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