The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Nov. 01, 2005
Applicants:
Michio Matsumura, Suita, JP;
Kazuya Tsujino, Suita, JP;
Inventors:
Michio Matsumura, Suita, JP;
Kazuya Tsujino, Suita, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/26 (2006.01); B32B 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A crystalline substratehaving straight or spiral deep pores is obtained in cost effective manner. A method for forming pores comprises the steps of preparing the monocrystalline substrateof which (100) surface is processed to be perpendicular to the depth direction of pores to be formed, and an etchant containing 10.0% by weight or less hydrofluoric acid; and chemically etching the substrate surface with metallic particlessuch as silver, platinum and palladium electroless-plated on it.