The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Sep. 29, 2006
Applicants:

Chih-lin Huang, Bellevue, WA (US);

Stanley L Floyd, Enumclaw, WA (US);

Mark a Stanish, Seattle, WA (US);

David N Bogue, Federal Way, WA (US);

Inventors:

Chih-Lin Huang, Bellevue, WA (US);

Stanley L Floyd, Enumclaw, WA (US);

Mark A Stanish, Seattle, WA (US);

David N Bogue, Federal Way, WA (US);

Assignee:

Weyerhaeuser NR Company, Federal Way, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/55 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods are provided for using light reflection patterns to determine various properties of fibrous materials, such as wood. More specifically, the present invention relates to methods for determining a dive angle for grain. Further, the present invention relates to methods for using information in Tplots, combined with knowledge of the microstructure of a wood sample surface, to find pith location and/or ring curvature.


Find Patent Forward Citations

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Huang, Chih-Lin. (2010). Methods for using light reflection patterns to determine location of pith and curvature of the annual ring (U.S. Patent No. 7715011). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7715011

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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