The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Sep. 11, 2006
Jean-philippe Piel, Marly-le-Roi, FR;
Jean-louis Stehle, Colombes, FR;
Jean-Philippe Piel, Marly-le-Roi, FR;
Jean-Louis Stehle, Colombes, FR;
Societe de Production et de Recherches Appliquees (S.O.P.R.A.), Bois-Colombes, FR;
Abstract
The invention concerns an equipment for monitoring an immersion lithography device provided with a main light source and a projection optics for printing images on a wafer. The propagating medium extending from the projection optics to the wafer consists of a liquid (). The equipment comprises: a chamber () for receiving at least part of said liquid (), a diffraction grating () immersed in the chamber; a secondary light source () for emitting a secondary incident beam () towards the grating so as to obtain a diffracted beam; angle measuring members () capable of measuring at least one diffraction angle corresponding to a maximum intensity of an order of diffraction of the beam diffracted by the grating (), and computing means () for calculating an estimate of a physical quantity concerning the refractive index of the liquid.