The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Jul. 06, 2006
Applicants:

Kunihiro Shiota, Kanagawa, JP;

Hiroshi Okumura, Kanagawa, JP;

Inventors:

Kunihiro Shiota, Kanagawa, JP;

Hiroshi Okumura, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device with a TFT includes a substrate, an island-shaped semiconductor film serving as an active layer of the TFT on or over the substrate, a pair of source/drain regions formed in the semiconductor film, and a channel region formed between the pair of source/drain regions in the semiconductor film. The pair of source/drain regions is thinner than the remainder of the semiconductor film other than the source/drain regions. The thickness difference between the pair of source/drain regions and the remainder of the semiconductor film is in a range from 10 angstrom (Å) to 100 angstrom. The total process steps are reduced and the operation characteristic and reliability of the device are improved.


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