The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
May. 13, 2008
Applicants:
Koji Asakawa, Tokyo, JP;
Kenichi Ohashi, Kawasaki, JP;
Akira Fujimoto, Kawasaki, JP;
Takashi Sasaki, Yokohama, JP;
Inventors:
Koji Asakawa, Tokyo, JP;
Kenichi Ohashi, Kawasaki, JP;
Akira Fujimoto, Kawasaki, JP;
Takashi Sasaki, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1):
Asakawa, Koji. (2010). Method of manufacturing semiconductor device, acid etching resistance material and copolymer (U.S. Patent No. 7714316). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7714316
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile