The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Mar. 30, 2000
Applicants:

David V. Pedersen, Scotts Valley, CA (US);

Igor Y. Khandros, Orinda, CA (US);

Inventors:

David V. Pedersen, Scotts Valley, CA (US);

Igor Y. Khandros, Orinda, CA (US);

Assignee:

FormFactor, Inc., Livermore, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01R 12/04 (2006.01); H05K 1/11 (2006.01);
U.S. Cl.
CPC ...
Abstract

Microelectronic contact structures () are lithographically defined and fabricated by applying a masking layer () on a surface of a substrate () such as an electronic component, creating an opening () in the masking layer, depositing a conductive trace of a seed layer () onto the masking layer and into the openings, and building up a mass of conductive material on the conductive trace. The sidewalls of the opening can be sloped (tapered). The conductive trace can be patterned by depositing material through a stencil or shadow mask (). A protruding feature () may be disposed on the masking layer so that a tip end () of the contact structure acquires a topography. All of these elements can be constructed as a group to form a plurality of precisely positioned resilient contact structures.


Find Patent Forward Citations

Loading…