The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Jun. 14, 2007
Applicants:

Seong-hoon Kang, Daejeon, KR;

In-kyu Park, Daejeon, KR;

Jong-suh Park, Gongju-si, KR;

Young-dae Kim, Daejeon, KR;

Jong-hyun Chae, Daejeon, KR;

Inventors:

Seong-Hoon Kang, Daejeon, KR;

In-Kyu Park, Daejeon, KR;

Jong-Suh Park, Gongju-si, KR;

Young-Dae Kim, Daejeon, KR;

Jong-Hyun Chae, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 45/81 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a method for preparing high-purity terephthalaldehyde which comprises re-crystallizing terephthalaldehyde crystals containing impurities, using an anti-solvent. Specifically, the present invention relates to a method for preparing terephthalaldehyde which comprises dissolving low-purity terephthalaldehyde prepared by a conventional method in dimethylsulfoxide and then re-crystallizing the solution, using water as an anti-solvent. The present invention is not only environment-friendly because it uses water only as an anti-solvent, but also economical because it may simply prepare high-purity terephthalaldehyde in a short time.


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