The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Feb. 21, 2007
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
Josef Maynollo, Villach, AT;
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
Josef Maynollo, Villach, AT;
Infineon Technologies North America Corp., San Jose, CA (US);
Abstract
A method for controlling etching during photolithography in the fabrication of an integrated circuit in connection with first and second features that are formed on the integrated circuit having a gap there between comprising depositing a layer of photoresist on the integrated circuit, selectively exposing portions of the photoresist through at least one photolithography mask having a pattern including means for alleviating line end shortening of the first and second lines adjacent the gap, and developing the photoresist after the selective exposing step.