The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Feb. 13, 2004
Applicants:

Yang Yang LI, Irvine, CA (US);

Frederique Cunin, 34250 Palavas les Flots, FR;

Michael J. Sailor, La Jolla, CA (US);

Jamie R. Link, Arlington, VA (US);

Ting Gao, Sunnyvale, CA (US);

Inventors:

Yang Yang Li, Irvine, CA (US);

Frederique Cunin, 34250 Palavas les Flots, FR;

Michael J. Sailor, La Jolla, CA (US);

Jamie R. Link, Arlington, VA (US);

Ting Gao, Sunnyvale, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of generating three-dimensional nanostructures that includes providing a silicon substrate, creating a porous silicon template from the silicon substrate, wherein the template is created to have a predetermined configuration, depositing a predetermined material on the porous silicon template, and removing the porous silicon template from the deposited material to leave a freestanding nanostructure.


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