The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
May. 26, 2006
Applicant:
Yasuo Hosoda, Saitama, JP;
Inventor:
Yasuo Hosoda, Saitama, JP;
Assignee:
Pioneer Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/76 (2006.01); G03C 1/494 (2006.01); G03C 1/492 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention mainly intends to provide a resist material that is high in the sensitivity to light and an electron beam and enables to form a clear and fine pattern with less exposure. In order to achieve the object, the invention provides a resist material comprising a metal compound, wherein a metal element constituting the metal compound is a 14group or 15group metal element and the metal compound is a stoichiometrically incomplete compound.
Hosoda, Yasuo. (2010). Resist material and electron beam recording resist material (U.S. Patent No. 7713678). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7713678
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile