The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Nov. 22, 2006
HI Kuk Lee, Yongin-si, KR;
Byung Uk Kim, Hwaseong-si, KR;
Hyoc Min Youn, Hwaseong-si, KR;
Joo Pyo Yun, Hwaseong-si, KR;
Woo Seok Jeon, Seoul, KR;
Hi Kuk Lee, Yongin-si, KR;
Byung Uk Kim, Hwaseong-si, KR;
Hyoc Min Youn, Hwaseong-si, KR;
Joo Pyo Yun, Hwaseong-si, KR;
Woo Seok Jeon, Seoul, KR;
Abstract
A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: