The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Oct. 18, 2005
Applicants:

Jehuda Greener, Rochester, NY (US);

James F. Elman, Fairport, NY (US);

Jon A. Hammerschmidt, Rochester, NY (US);

Elizabeth K. Priebe, Rochester, NY (US);

Inventors:

Jehuda Greener, Rochester, NY (US);

James F. Elman, Fairport, NY (US);

Jon A. Hammerschmidt, Rochester, NY (US);

Elizabeth K. Priebe, Rochester, NY (US);

Assignee:

Nitto Denko Corporation, Ibaraki-Shi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 19/00 (2006.01); G02F 1/1333 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming an optical compensation film includes coating one or more first layers and one or more second layers onto a carrier substrate, and stretching the first layers and second layers simultaneously. The one or more first layers include a polymer having an out-of-plane birefringence (Δn) not more negative than −0.005 and not more positive than +0.005, and the one or more second layers include a polymer having an out-of-plane birefringence more negative than −0.005 or more positive than +0.005. The overall in-plane retardation (R) of the optical compensation film is greater than 20 nm and the out-of-plane retardation (R) of the optical compensation film is more negative than −20 nm or more positive than +20 nm.


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