The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2010

Filed:

Jan. 20, 2009
Applicants:

Guo-dung Su, Taipei, TW;

Hsin-ta Hsieh, Taipei, TW;

Inventors:

Guo-Dung Su, Taipei, TW;

Hsin-Ta Hsieh, Taipei, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for fabricating micro-lenses and a method for fabricating micro-lenses by photolithography are provided. The method includes forming a plurality of micro-cavities in a substrate, filling lens material into each of the micro-cavities, and heating the lens material, thereby reflowing the lens material so as to form a plurality of micro-lenses in the substrate. The micro-cavities define a boundary of each of the micro-lenses formed by reflowing the lens material, thereby preventing adjacent micro-lenses from fusing together by reflowing when overheated. The process uses negative photoresist and positive photoresist as micro-cavities and lens material respectively, thereby streamlining the fabrication method and its steps.


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